X-ray diffraction study of strain relaxation, spontaneous compositional gradient, and dislocation density in GeSn/Ge/Si(100) heterostructures

Salamo, Gregory J

Title
X-ray diffraction study of strain relaxation, spontaneous compositional gradient, and dislocation density in GeSn/Ge/Si(100) heterostructures
Authors
Stanchu, H; Kuchuk, AV;Mazur, YI;Margetis, J;Tolle, J;Richter, J;Yu, SQ;Salamo, GJ
Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume
35
Issue
7
Year
2020
DOI
10.1088/1361-6641/ab883c