Light-directed electrochemical patterning of copper structures
by Coridan, Robert H.; Lowe, James M.
A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
- Patent Number
- USUS2020370193 A1 2020-11-26
- Application Number
- B2
- Publication Year
- 2022
- URL
- https://scholarworks.uark.edu/pat/431