Individually addressable, submicrometer band electrode arrays. 1. Fabrication from multilayered materials
by Nagale, M. P.; Fritsch, I.
Useful analytical application of submicrometer band electrodes depends strongly upon developing reproducible, convenient fabrication and characterization procedures. We report fabrication of arrays of individually addressable submicrometer band electrodes that are 2 mm long and functional down to 37.0 nm in width, using multilayered materials and conventional microfabrication techniques. Fabrication involves thermal vapor deposition of a chromium adhesion layer and a gold layer on glass, followed by plasma-enhanced chemical vapor deposition of a silicon nitride layer, photolithography, and reactive ion etching. The topography of each layer was studied using contact-mode atomic force microscopy, Surfaces show larger features as the thickness of gold increases. Silicon nitride topography shows a relatively smoother surface, indicating that it may serve as a planarizing layer for subsequent gold layers, Cyclic voltammetry at 0.10 V/s of individual band electrodes in a solution of RU(NH3)(6)(3+) shows a typical sigmoidal response, as would be expected when the diffusion layer exceeds the smallest dimension of the electrodes, At faster scan rates, peak-shaped voltammograms are observed, as expected. Good reproducibility of electrochemical behavior was obtained for electrodes in the same array.
- Journal
- Analytical Chemistry
- Volume
- 70
- Issue
- 14
- Year
- 1998
- Start Page
- 2902-2907
- URL
- https://dx.doi.org/10.1021/ac971040x
- ISBN/ISSN
- 1520-6882; 0003-2700
- DOI
- 10.1021/ac971040x